Part II: Experimental validation of the non-local stress/curvature relations

نویسندگان

  • M. A. Brown
  • X. Feng
  • Y. Huang
  • Ersan Üstündag
چکیده

The classical Stoney formula relating local equibiaxial film stress to local equibiaxial substrate curvature is not well equipped to handle realistic cases where the film misfit strain, the plate system curvature, and the film thickness and resulting film stress vary with in-plane position. In Part I of this work we have extended the Stoney formula to cover arbitrarily non-uniform film thickness for a thin film/substrate system subject to non-uniform, isotropic misfit strains. The film stresses are found to depend non-locally on system curvatures. In Part II we have designed a demanding experiment whose purpose is to validate the new analysis for the case of radially symmetric deformations. To achieve this, a circular film island with sharp edges and a radially variable, but known, thickness is deposited on the wafer center. The plate system’s curvatures and the film stress distribution are independently measured by using white beam and monochromatic X-ray microdiffraction (lXRD) measurements, respectively. The measured stress field (from monochromatic lXRD) is compared to the predictions of various stress/curvature analyses, all of which have the white beam lXRD measurements as input. The results reveal the shortcomings of the ‘‘local’’ Stoney approach and validate the accuracy of the new ‘‘non-local’’ relation, most notably near the film island edges where stress concentrations dominate. 2006 Elsevier Ltd. All rights reserved.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Non-uniform, axisymmetric misfit strain: in thin films bonded on plate substrates/substrate systems: the relation between non-uniform film stresses and system curvatures

Current methodologies used for the inference of thin film stress through curvature measurements are strictly restricted to stress and curvature states which are assumed to remain uniform over the entire film/substrate system. By considering a circular thin film/substrate system subject to non-uniform, but axisymmetric misfit strain distributions in the thin film, we derived relations between th...

متن کامل

Spatially non-uniform, isotropic misfit strain in thin films bonded on plate substrates: The relation between non-uniform film stresses and system curvatures

Current methodologies used for the inference of thin film stress through curvature measurements are strictly restricted to stress and curvature states which are assumed to remain uniform over the entire film/substrate system. By considering a circular thin-film/substrate system subject to arbitrarily non-uniform misfit strain distributions, we derive relations between the film stresses and the ...

متن کامل

Extension of Stoney’s formula to non-uniform temperature distributions in thin film/substrate systems. The case of radial symmetry

Current methodologies used for the inference of thin film stress through curvature measurements are strictly restricted to stress and curvature states which are assumed to remain uniform over the entire film/substrate system. By considering a circular thin film/substrate system subject to non-uniform, but axisymmetric temperature distributions, we derive relations between the film stresses and ...

متن کامل

Extension of Stoney’s Formula to Arbitrary Temperature Distributions in Thin Film/Substrate Systems

Current methodologies used for the inference of thin film stress through curvature measurements are strictly restricted to stress and curvature states that are assumed to remain uniform over the entire film/substrate system. By considering a circular thin film/ substrate system subject to nonuniform and nonaxisymmetric temperature distributions, we derive relations between the film stresses and...

متن کامل

Stresses in a Multilayer Thin Film/Substrate System Subjected to Nonuniform Temperature

Current methodologies used for the inference of thin film stress through curvature measurements are strictly restricted to uniform film stress and system curvature states over the entire system of a single thin film on a substrate. By considering a circular multilayer thin film/substrate system subjected to nonuniform temperature distributions, we derive relations between the stresses in each f...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2006